General Information

About the conference

The ADCHEM 2003 conference will be postponed to January 11-14, 2004 in Hong Kong SAR, China. Organized under the auspices of International Federation of Automatic Control (IFAC), ADCHEM (International Symposium on Advanced Control of Chemical Processes) is a continuing series of international conferences held most recently in Pisa, Italy (2000), Banff, Canada (1997), Kyoto, Japan (1994), and Toulouse, France (1991). These meetings focus on advances in methods for control and modeling for all types of chemical processes and are part of a three year rotation of IFAC meetings in process control, which also include the IFAC DYCOPS Symposium Series (most recently held in Korea, 2001 and Greece, 1998) and the IFAC World Congress.
ADCHEM 2003 will take place just after PSE 2003 (The 8th International Symposium on Process Systems Engineering) in Kunming, China. This is so arranged to allow colleagues to attend both conferences in a single trip to Asia.

Topics

For the upcoming ADCHEM conference, contributed papers will be considered in all areas of advanced control for process systems including the following areas:

Modeling and Identification: including first principle models, linear and nonlinear identification techniques, data driven models, model reduction for control and optimization, etc. (Chair: J. Qin, USA)
Model Based Control: including linear and nonlinear MPC, robustness issues, adaptive control, control of discrete event and hybrid systems, differential geometric concepts, control of distributed parameter systems, optimization based methods, observers, filters, etc. (Chair: J. Lee, USA)
Real-time Optimization and Scheduling: including optimization of steady state and dynamic models, integration with control systems, optimization based methods, etc. (Chair: S. Hasebe, Japan)
Process and Control Monitoring: including PCA, multiscale and other statistical techniques, auditing of sensors, fault detection and isolation, etc. (Chair: B. Huang, Canada)
Batch Process Modeling and Control: including advanced control and monitoring methods for batch, semi-continuous, and periodic process, batch optimization and scheduling, data reconciliation, etc. (Chair: D. Bonvin, Switzerland)
Process Control Applications: including the control of processes from the following areas: chemical, biological, environmental, petrochemical, pharmaceutical, pulp and paper, refineries, etc. (Chair: B. Foss, Norway)

The conference may also feature panel discussions on topical areas.

Call for Contributed Papers

Authors are invited to submit papers in any technical area relevant to this symposium. The paper should not exceed six pages, following the same double column format used by the 2002 IFAC World Congress. Formatting instructions can be found on the IFAC website: www.ifac-control.org under “Info Authors”, then go to subheading of "IFAC/Elsevier information for authors"

Contributed papers should be submitted electronically to the following website:

http://www.adchem2003.uni-stuttgart.de

Where complete information on the submission process can be found.

Plenary and keynote lectures will be selected at a later date, please visit the conference website regularly for this and other updates:

http://www.ust.hk/adchem2003

Location of ADCHEM 2003

Hong Kong - the City of Life, is a fascinating place to visit. There are so many things in store for visitors who come from all corners of the world. Those who have visited Hong Kong before, they love to come back and renew their experiences. Those who have not been here before will surely have an unforgettable experience. Hong Kong is coined as the shoppers' paradise and heaven of foods. It is also the gateway to Mainland China. Not only Hong Kong has many splendid tourist attractions, it boasts itself as a metropolis well suited for the 21st century.
Please find more exciting information about Hong Kong at:

http://www.hkta.org/

Language

English will be the official language throughout the symposium

Organizing Chair

Professor Furong Gao
Department of Chemical Engineering
The Hong Kong University of Science & Technology
Clearwater Bay, Kowloon, Hong Kong
Email: adchem03@ust.hk
Tel: +852-2358-7139
Fax: +852-2358-0054

International Program Committee, Chair

Prof. Dr.-Ing. Frank Allgower
Institute for Systems Theory in Engineering
University of Stuttgart
Pfaffenwaldring 9
70550 Stuttgart
Germany
Email: allgower@ist.uni-stuttgart.de
Tel: +49-711-685-7733
Fax: +49-711-685-7735

The material submitted for presentation at an IFAC meeting (congress, symposium, conference, workshop) must be original, not published or being considered elsewhere. All papers for presentation will appear in the Preprints of the meeting and will be distributed to the participants. Papers duly presented will be archived and offered for sale, in the form of Proceedings, by Elsevier Science Ltd, Oxford, UK. The papers which have been presented will be further screened for possible publication in the IFAC Journals: Automatica and Control Engineering Practice, or in IFAC affiliated journals. All papers presented will be recorded in Control Engineering Practice.

Copyright of material presented at an IFAC meeting is held by IFAC. Authors will be sent a copyright transfer form. Automatica, Control Engineering Practice, and these IFAC affiliated journals have priority access to all contributions presented. However, if the author is not contacted by an editor of these journals within three months after the meeting, the author is free to re-submit the material for publication elsewhere. In this case, the paper must carry a reference to the IFAC meeting where it was originally presented.

Publications After Conferences

All the papers which have been presented will be screened for possible publication in the IFAC Journals.

Journal of Process Control and Control Engineering Practice have agreed each to publish a special issue for the conference.

Elsevier will also publish the Proceeding of the conference and arrange to index the presented papers in a range of abstracting and indexing services.

Registration Fees

Registration fee:   US$450   (on or before 10 October, 2003)

Late registration fee:   US$500   (after 10 October, 2003)

Student fee:   US$225 (on or before 10 October, 2003)

                    US$250 (after 10 October, 2003)